RICH‘s technology is suitable for simple molecular nitrogen, hydrogen, oxygen, carbon monoxide, carbon dioxide gas and inert gases argon, helium, krypton, xenon, neon, as well as low-carbon straight-chain saturated hydrocarbons methane, ethane, propane, butane and other gases, hydrogenation to remove oxygen impurities or oxygen to remove hydrogen impurities, to obtain high-purity gases.
40 Years of Industrial Gas Solutions Experience – Delivering ultra-high purity gas purification systems for semiconductor, laboratory, aerospace, and energy industries.
Global Expertise Since 1979
Over 4,000 systems in stable operation across more than 60 countries.
Full Product Range & Modular Design
From point-of-use gas purifiers for labs to high-capacity industrial bulk systems.
Ultra-High Purity Performance
Reduce O₂, H₂O, CO₂, CO, THC to < 1 ppb; purity up to 99.999999%.
Harsh Environment Verification
Proven stable operation from –40 °C Siberian oilfields to +50 °C Middle East deserts.
Customization Capability
Tailored designs for semiconductor fabs, aerospace assembly, gloveboxes, welding, and more.
Point-of-Use Gas Purifiers – For high-purity requirements in laboratories, analytical instruments, and semiconductor tools.
Bulk Gas Purification Systems – Industrial-scale purification for nitrogen, oxygen, argon, hydrogen, and specialty gases.
Modular Skid-Mounted Purifiers – Plug-and-play units for rapid deployment in production lines.
Glovebox & Inert Atmosphere Purifiers – Maintain <1 ppm O₂ and H₂O for R&D and manufacturing.
Catalytic & Adsorption Purifiers – Target removal of hydrocarbons, CO, CO₂, and moisture.
| Parameter | Value/Range |
|---|---|
| Purity Level | ≤ 1 ppb O₂ / H₂O / THC / CO₂ / CO |
| Flow Rate Range | 1 – 10,000 Nm³/h |
| Operating Pressure | 0.3 – 30 MPa |
| Filtration Precision | Down to 0.0015 μm |
| Materials | 316L Stainless Steel, Nickel Alloy |
| Leak Rate | ≤ 1 × 10⁻⁹ atm·cc/sec |
| Temperature Range | –40 °C to +80 °C |
| Pressure Drop | ≤ 0.1 MPa |
RICH gas purifiers use a combination of molecular sieve adsorption, getter materials, and catalytic oxidation/reduction to remove trace contaminants from process gases.
Adsorption Stage: Removes moisture and CO₂
Catalytic Stage: Eliminates hydrocarbons and CO
Getter Stage: Captures residual O₂ to achieve sub-ppb levels
Semiconductor Manufacturing – Lithography, CVD, etching
Aerospace & Defense – Spacecraft assembly, laser cutting
Analytical Laboratories – GC/MS, ICP, FTIR
Medical & Pharmaceutical – Inert packaging, controlled atmosphere rooms
Energy & Metallurgy – High-purity shielding gases for welding and smelting
Free Technical Consultation – “Ask an Engineer” form for project feasibility checks
Quick Quotation Tool – Get pricing within 24 hours
Download Center – Technical datasheets, operation manuals, and case studies
Global After-Sales Network – 48-hour spare parts delivery worldwide
OEM/ODM Service – Custom branding, design, and control interface
