RICH‘s technology is suitable for simple molecular nitrogen, hydrogen, oxygen, carbon monoxide, carbon dioxide gas and inert gases argon, helium, krypton, xenon, neon, as well as low-carbon straight-chain saturated hydrocarbons methane, ethane, propane, butane and other gases, hydrogenation to remove oxygen impurities or oxygen to remove hydrogen impurities, to obtain high-purity gases.
——Hydrogenation Deoxidation/Dehydrogenation Purification Systems, Meeting Ultra-High Purity Gas Requirements for Semiconductor, Chemical, and New Energy Industries——
✅ Global Multi-Gas Compatibility: Single system supports purification of 20+ gases including nitrogen, hydrogen, oxygen, inert gases (argon/krypton/xenon), and hydrocarbons (methane/propane)
✅ Industry Benchmark for Purity: Oxygen impurities ≤0.1ppm, hydrogen impurities ≤0.05ppm, meeting electronic-grade (6N) gas standards
✅ Proven Performance in Extreme Conditions: From -196°C liquid helium purification to 450°C high-temperature hydrocarbon dehydrogenation, with 1000+ systems operating reliably
✅ 35% Lower Energy Consumption: Intelligent adsorption tower regeneration technology, saving 1/3 energy compared to traditional PSA systems
